Chip manufacturer Tower Semiconductor has announced a $3 billion investment in Japan to enhance chip manufacturing, which includes a $1 billion grant from the Japanese government. The first phase will significantly increase the production capacity of 300 mm silicon photonic devices, expected to be fully operational by the fourth quarter of 2027. This phase includes the renovation of the existing Fab 6 facility to enable 300 mm silicon photonic device production and advanced packaging capabilities. The second phase will commence simultaneously with the first phase, involving the construction of a new 300 mm lithography equipment manufacturing plant next to the Fab 7 facility.
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